Quartz glass in the semiconductor industrial equipment, the use of temperature is often in the 1000 ℃ to 1300 ℃ high temperature state, in this state due to the impurity caused by devitrification occurred, devitrified part of the quartz crystal, crystal The change point of 275 ℃, when the quartz glass from the high temperature dropped to the metamorphic temperature, the surface devitrification of the crystalline part of the quartz glass itself with the high temperature of the α phase and low temperature β-phase expansion coefficient is different in the rapid cooling of the opaque Stripping more serious when it will cause the phenomenon of rupture. In order to make the quartz products can be used longer, we must pay attention to prevent the cause of quartz devitrification, and cause damage to the source of pollution is alkali metal, alkaline earth metal, sweat, saliva, oil, dust ... ... and so on. And 0.1 mg / cm2l} k will result in tens or hundreds of times the amount of loss. Therefore, to prevent these sources of contamination attached to the quartz surface in addition to not directly empty hand to get the quartz, the use of high temperature operation must first do the cleaning work to ensure the cleanliness of the quartz surface.

    General quartz cleaning need some procedures, first with pure water first rinse the surface, and then placed in the pickling tank soak some time, remove and then rinse with pure water to dry.